Indium Bonded HIP Metal Sputtering Target For Various Film Coatings

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Product Details
Target Bonding Indium Forming Process Hot Isostatic Pressing(HIP)
Surface Polished, Anodizing Material Metal
Thickness 10-600mm Density Customized
Coating Method Sputtering Crystal Structure Customized
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Product Description

Product Description:

Made from high-quality metal materials, our Metal Sputtering Target is built to last. With a thickness ranging from 10-600mm, this product is perfect for a wide range of applications and compatible with customized substrates.

Our Metal Sputtering Target product is bonded with Indium, ensuring a strong and secure bond that lasts even under the most demanding conditions. This makes it ideal for use in a variety of settings, including semiconductor manufacturing and thin film deposition.

Whether you are using a Carbon Steel I Beam or an Electrostatic Powder Coating Gun, our Metal Sputtering Target product will provide you with the precision and accuracy you need for your project. Trust in our product to deliver the best results every time.


Features:

  • Product Name: Metal Sputtering Target
  • Forming Process: Hot Isostatic Pressing (HIP)
  • Surface Finish: Polished
  • Thickness: 10-600mm
  • Shape: Round
  • Surface: Polished, Anodizing

Our Metal Sputtering Target is produced using the Hot Isostatic Pressing (HIP) process, resulting in a high-quality product with a polished surface finish. The thickness ranges from 10-600mm, and the shape is round. The target surface is available in polished or anodized finish to meet your specific requirements. This product can be used in various applications, including Hand Held Metal Detector, 3D Printing Metal Powder, and Industrial Metal Detector Conveyor.


Technical Parameters:

Attribute Value
Shape Round
Target Configuration Single or Multiple
Target Bonding Indium
Crystal Structure Customized
Technique Forged and CNC Machined
Forming Process Hot Isostatic Pressing (HIP)
Material Metal
Thickness 10-600mm
Surface Finish Polished
Density Customized

Applications:


Customization:

Our Metal Sputtering Target product comes with customizable services to meet your specific needs. You can customize the purity of the target to be 99.99%. The target shape is round, and the crystal structure can be customized to your requirements. The target material is made of alloy steel metal, ensuring durability and longevity. Our product also has a polished surface and anodizing surface for precision and consistency in your applications.

Our team of experts can assist you in product customization for your specific application needs. Whether you need to modify the purity, shape, crystal structure, or surface of the target, we can help you achieve the desired results. Contact us today to learn more about our product customization services.

Our Metal Sputtering Target product is perfect for various applications such as Carbon Steel I Beam, Conveyor Metal Detector Machine, and more.


Support and Services:

Our Metal Sputtering Targets are designed to meet the highest industry standards for purity, composition, and uniformity. We offer a range of target materials including gold, silver, copper, aluminum, and titanium. Our targets are available in various sizes and configurations to meet your specific application needs.

In addition to our high-quality targets, we also offer technical support and services to ensure optimal performance of your sputtering system. Our team of experts can assist with target installation, troubleshooting, and maintenance. We also offer target bonding services to provide a secure and reliable connection between the target and the backing plate.

At our state-of-the-art facility, we utilize advanced manufacturing techniques and rigorous quality control processes to deliver targets of the highest quality. Contact us today to learn more about our Metal Sputtering Targets and how we can support your sputtering applications.